Process

The process requires usual and cheap reagents (sand..) and occurs in a standard tubular oven.

The growth of the nanowire is carried out in the absence of catalyst
The growth temperature reaches 1400°C.
graphite growth support is used.

            

The nanowire is obtained by reacting
- a carbon derivative in gaseous phase
- a silicon derivative in gaseous phase
-
optionally a nitrogen derivative in gaseous phase.


The process is directly transferable to industry, with the benefit of a yield 10 to 100 times higher than usual process such as the processes by "template", by nucleation or "ball milling".

Contact us : Philippe Roussel+33 (0)4-37-37-42-98

philippe.roussel@universite-lyon.fr
-- Link to Key_points_Si-based_nanowire.pdf (253.30 Kb) --